Effect of GeCl4/SiCl4 flow ratio on germanium incorporation in MCVD process

Tekijä Mat Sharif, Khairul Anuar, Zulkifli, Mohd Imran, Muhamad Yassin, Shahrin Zen, Tamchek, Nizam, Aljamimi, Salah Mohammed, Yusoff, A., Mohd Amin, Yusoff, S. A., Siti Shafiqah, Abdul Rashid, Hairul Azhar
Julkaistu 2013