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Film deposition by plasma techniques /

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Detalles Bibliográficos
Autor Principal:	Konuma, Mitsuharu, 1950- .
Formato:	Libro
Idioma:	English
Publicado:	Berlin : Springer-Verlag, 1992.
Series:	Springer series on atoms + plasmas ; V.10.
Subjects:	Thin films. Plasma-enhanced chemical vapor deposition.
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