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Film deposition by plasma techniques /

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Bibliografske podrobnosti
Glavni avtor:	Konuma, Mitsuharu, 1950- .
Format:	Knjiga
Jezik:	English
Izdano:	Berlin : Springer-Verlag, 1992.
Serija:	Springer series on atoms + plasmas ; V.10.
Teme:	Thin films. Plasma-enhanced chemical vapor deposition.
Oznake:	Označite Brez oznak, prvi označite!

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