Precursor Chemistry of Advanced Materials CVD, ALD and Nanoparticles /
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new ro...
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| 企业作者: | |
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| 其他作者: | |
| 格式: | 电子 电子书 |
| 语言: | English |
| 出版: |
Berlin, Heidelberg :
Springer Berlin Heidelberg : Imprint: Springer,
2005.
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| 版: | 1st ed. 2005. |
| 丛编: | Topics in Organometallic Chemistry,
9 |
| 主题: | |
| 在线阅读: | https://doi.org/10.1007/b75019 |
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书本目录:
- M.D. Allendorf, A.M.B. van Mol: Gas-Phase Thermochemistry and Mechanism of Organometallic Tin Oxide CVD Precursors
- A. Devi, R.A. Fischer, J. Müller and R. Schmid: Materials Chemistry of Group-13 Nitrides
- M. Veith, S. Mathur: Single-Source-Precursor CVD: Alkoxy and Siloxy Aluminum Hydrides
- S. Schulz: CVD Deposition of Binary AlSb and GaSb Material Films - A Single-Source Approach
- M. Putkonen, L. Niinistö: Organometallic Precursors For Atomic Layer Deposition
- Ph. Serp, J.-C. Hierso and Ph. Kalck: Surface Reactivity of Transition Metal CVD Precursors: towards the Control of the Nucleation Step
- M.A. Malik and P. O'Brien: Organometallic and Metal-organic Precursors for Nanoparticles.