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Film deposition by plasma techniques /

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Détails bibliographiques
Auteur principal:	Konuma, Mitsuharu, 1950- .
Format:	Livre
Langue:	English
Publié:	Berlin : Springer-Verlag, 1992.
Collection:	Springer series on atoms + plasmas ; V.10.
Sujets:	Thin films. Plasma-enhanced chemical vapor deposition.
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