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Film deposition by plasma techniques /

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Dettagli Bibliografici
Autore principale:	Konuma, Mitsuharu, 1950- .
Natura:	Libro
Lingua:	English
Pubblicazione:	Berlin : Springer-Verlag, 1992.
Serie:	Springer series on atoms + plasmas ; V.10.
Soggetti:	Thin films. Plasma-enhanced chemical vapor deposition.
Tags:	Aggiungi Tag Nessun Tag, puoi essere il primo ad aggiungerne! !

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