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Film deposition by plasma techniques /

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書誌詳細
第一著者:	Konuma, Mitsuharu, 1950- .
フォーマット:	図書
言語:	English
出版事項:	Berlin : Springer-Verlag, 1992.
シリーズ:	Springer series on atoms + plasmas ; V.10.
主題:	Thin films. Plasma-enhanced chemical vapor deposition.
タグ:	タグ追加タグなし, このレコードへの初めてのタグを付けませんか!

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