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Film deposition by plasma techniques /

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Библиографические подробности
Главный автор:	Konuma, Mitsuharu, 1950- .
Формат:	‌
Язык:	English
Опубликовано:	Berlin : Springer-Verlag, 1992.
Серии:	Springer series on atoms + plasmas ; V.10.
Предметы:	Thin films. Plasma-enhanced chemical vapor deposition.
Метки:	Добавить метку Нет меток, Требуется 1-ая метка записи!

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